PDF | La solution solide Ga1-xInxAs ySb1-y a été cristallisée par la technique d’ épitaxie en phase liquide sur substrat GaSb orienté () et ()B dans la. Procédé d’épitaxie dans lequel le corps à partir duquel est formée la couche épitaxiale est amené à l’état liquide en contact avec le substrat à épitaxier. Resume: Un diagramme de phase precis dans la region riche en indium du systeme ternaire Ga-In-Sb a ete etabli. Les points du liquidus ont ete obtenus par .

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Phas and Masers [1]. The graphene film is then patterned and arrays of nanometer-wide openings are etched in graphene revealing the SiC substrate.

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Diagramme de phases et croissance par epitaxie en phase liquide du gaxin1-xsb

Quelques resultats de mesures electriques sont fournis. The process consists in first growing a graphene layers film on the C-face of 4H-SiC by confinement-controlled sublimation of silicon carbide.

Additionally, the model proposes an explanation for the properties of the obtained films as a function of the annealing conditions, based on optical microscope and AFM observations and bonding energy characterization. Epitaxial growth of gallium oxide films on c-cut sapphire substrate W.

An arrangement for measuring the thermoelectric voltage Seebeck signal during the crystal growth from a liquid zone is described. This constraint is a difficulty to circumvent as these faces are not present in the standard equilibrium morphology. The study proposes different characterization of the films obtained by this process AFM, eoitaxie profilometry and 4 probe measurement.


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One of the main limitations to a mass market development of nanostructure based devices is the integration at a moderate cost of nano-objects into smart architectures. The first process allows to produce films of silicon on sapphire and films of silicon on glass by considering a laser annealing. Indium oxide thin films were grown by pulsed electron beam deposition method at C on c-cut sapphire and oriented LaAlO3 single crystal substrates in oxygen or argon gas.

Epitaxial growth of gold on mica in an ultra-high vacuum. Using films exposing 6-fold symmetry surfaces such as PtAuand Cothe Co heterogeneous nucleation and epitaxial growth leads to vertical nanowires self-organized in dense and large scale arrays.

We demonstrated this process with the ferroelectric crystal KTiOPO4 which is one of the most promising candidate materials for that purpose. We have made light attenuation experiments to investigate the sedimentation in such systems.

Nanoselective area growth of gan by metalorganic vapor phase epitaxy on 4h-sic using epitaxial graphene as a mask G. Toward a complete description of nucleation and growth in liquid-liquid phase separation J.

Abstract An accurate ternary phase diagram in the In rich region of the Ga-In-Sb system has been established. Previous article Next article.

In which subject field? Here we develop a epitaxir approach by adapting the seed-mediated solution phase synthesis of nanocrystals in order to directly grow them on crystalline thin films. The phase separation mechanism of a binary liquid mixture off-critically quenched in its miscibility gap is nucleation and growth, its homogeneous phase reaching a metastable equilibrium state.


GaN nanomesas grow epitaxially with perfect selectivity on SiC, in openings patterned through graphene, with no nucleation on graphene. Les points du solidus resultent de la mesure de la concentration en gallium de cristaux ternaires epitaxies a partir de liquides epitxaie en indium.

L’homogeneite et les autres caracteristiques de ces couches liqiide ete examinees. The successive stages of growth of the nucleated droplets are a diffusion-driven free growth, an intermediate regime and a coarsening by reduction of interface.

Les points du liquidus ont ete obtenus par analyse thermique differentielle d’echantillons de composition determinee. Single crystalline nanorods are grown in epitaxy on the mica surface with a growth axis along directions and plane parallel dn the substrate. The second produces foils of monocrystalline silicon by liquid phase epitaxial growth on implanted silicon substrate. Des couches de GaxIn1-xSb de 0 x 0,92 ont ete epitaxiees sur substrats d’InSb orientes dans la gamme de temperatures C.

Have you forgotten your login? WO3 is sublimated at a relatively low temperature in air at atmospheric pressure. Services Articles citing this article CrossRef PACS – Phase equilibria, phase transitions, and critical points. It is then necessary to find the growth conditions enabling to work below the roughening temperature of these faces.

Epitadie effect of adsorbed gas on the growth of gold films on mica at epitaxial temperatures is investigated by comparing the growths on air exposed and vacuum cleaved mica surfaces.